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BIBFRAME Instances
42
BIBFRAME Works
38
Type
Instance
42
Monograph
38
Text
38
Work
38
Deprecated
2
Multimedia
2
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10
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42
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Results: 1-20 of 80
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Label
Dataset
Type
Subdivision
Identifier
1.
Erdmann, Andreas Optical and EUV lithography Bellingham: SPIE--The International Society for Optical Engineering; 2021
BIBFRAME Instances
Instance
21728574
2.
Erdmann, Andreas Optical and EUV lithography Bellingham: SPIE--The International Society for Optical Engineering; [2021]
BIBFRAME Instances
Instance
21726932
3.
Selected papers on resolution enhancement techniques in optical lithography
BIBFRAME Works
Work
Text
Monograph
13450340
4.
Optical Society of America Extreme ultraviolet lithography Washington, DC: The Society; c1994
BIBFRAME Instances
Instance
1599703
5.
European Mask and Lithography Conference (30th : 2014 : Dresden, Germany) 30th European Mask and Lithography Conference
BIBFRAME Works
Work
Text
Monograph
19172010
6.
Lin, Burn Jeng, 1942- Optical lithography Bellingham, Washington USA: SPIE; [2021]
BIBFRAME Instances
Instance
21776685
7.
Mack, Chris A. Fundamental principles of optical lithography Chichester, West Sussex, England; Hoboken, NJ, USA: Wiley; c2007
BIBFRAME Instances
Instance
15059841
8.
Lin, Burn Jeng, 1942- Optical lithography Bellingham, Washington: SPIE; [2021]
BIBFRAME Instances
Instance
21791304
9.
Lin, Burn Jeng, 1942- Optical lithography Bellingham, Wash: SPIE; c2009
BIBFRAME Instances
Instance
15995580
10.
Wong, Alfred Kwok-Kit Resolution enhancement techniques in optical lithography Bellingham, Wash: SPIE Press; c2001
BIBFRAME Instances
Instance
12289793
11.
Mack, Chris A. Field guide to optical lithography Bellingham, Wash: SPIE Press; 2006
BIBFRAME Instances
Instance
14180590
12.
Schellenberg, F. M., 1959- Selected papers on resolution enhancement techniques in optical lithography Bellingham, Wash: SPIE Press; c2004
BIBFRAME Instances
Instance
13450340
13.
European Mask and Lithography Conference (30th : 2014 : Dresden, Germany) 30th European Mask and Lithography Conference
BIBFRAME Instances
Instance
19172010
14.
European Mask and Lithography Conference (Conference) (32nd : 2016 : Dresden, Germany) 32nd European Mask and Lithography Conference Bellingham, Washington, USA: SPIE; [2016]
BIBFRAME Instances
Instance
Deprecated
20980314
15.
European Mask and Lithography Conference (24th : 2008 : Dresden, Germany) EMLC 2008
BIBFRAME Works
Work
Text
Monograph
16276896
16.
Marrian, Christie R. K. Technology of proximal probe lithography Bellingham, Wash: SPIE Optical Engineering Press; c1993
BIBFRAME Instances
Instance
1577791
17.
Jain, Kanti, 1948- Excimer laser lithography Bellingham, Wash., USA: SPIE Optical Engineering Press; c1990
BIBFRAME Instances
Instance
3871905
18.
Levinson, Harry J. Lithography process control Bellingham, Wash: SPIE Optical Engineering Press; c1999
BIBFRAME Instances
Instance
4508656
19.
Blais, Phillip D. Submicron lithography Bellingham, Wash: International Society for Optical Engineering; 1982
BIBFRAME Instances
Instance
3752512
20.
European Mask and Lithography Conference (22nd : 2006 : Dresden, Germany) EMLC 2006 Bellingham, Wash: SPIE; c2006
BIBFRAME Instances
Instance
14674171
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