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  Label Dataset Type Subdivision Identifier
1. Erdmann, Andreas Optical and EUV lithography Bellingham: SPIE--The International Society for Optical Engineering; 2021

 BIBFRAME Instances
 Instance 21728574
2. Erdmann, Andreas Optical and EUV lithography Bellingham: SPIE--The International Society for Optical Engineering; [2021]

 BIBFRAME Instances
 Instance 21726932
3. Selected papers on resolution enhancement techniques in optical lithography

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 Work
Text
Monograph		 13450340
4. Optical Society of America Extreme ultraviolet lithography Washington, DC: The Society; c1994

 BIBFRAME Instances
 Instance 1599703
5. European Mask and Lithography Conference (30th : 2014 : Dresden, Germany) 30th European Mask and Lithography Conference

 BIBFRAME Works
 Work
Text
Monograph		 19172010
6. Lin, Burn Jeng, 1942- Optical lithography Bellingham, Washington USA: SPIE; [2021]

 BIBFRAME Instances
 Instance 21776685
7. Mack, Chris A. Fundamental principles of optical lithography Chichester, West Sussex, England; Hoboken, NJ, USA: Wiley; c2007

 BIBFRAME Instances
 Instance 15059841
8. Lin, Burn Jeng, 1942- Optical lithography Bellingham, Washington: SPIE; [2021]

 BIBFRAME Instances
 Instance 21791304
9. Lin, Burn Jeng, 1942- Optical lithography Bellingham, Wash: SPIE; c2009

 BIBFRAME Instances
 Instance 15995580
10. Wong, Alfred Kwok-Kit Resolution enhancement techniques in optical lithography Bellingham, Wash: SPIE Press; c2001

 BIBFRAME Instances
 Instance 12289793
11. Mack, Chris A. Field guide to optical lithography Bellingham, Wash: SPIE Press; 2006

 BIBFRAME Instances
 Instance 14180590
12. Schellenberg, F. M., 1959- Selected papers on resolution enhancement techniques in optical lithography Bellingham, Wash: SPIE Press; c2004

 BIBFRAME Instances
 Instance 13450340
13. European Mask and Lithography Conference (30th : 2014 : Dresden, Germany) 30th European Mask and Lithography Conference

 BIBFRAME Instances
 Instance 19172010
14. European Mask and Lithography Conference (Conference) (32nd : 2016 : Dresden, Germany) 32nd European Mask and Lithography Conference Bellingham, Washington, USA: SPIE; [2016]

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 Instance
Deprecated		 20980314
15. European Mask and Lithography Conference (24th : 2008 : Dresden, Germany) EMLC 2008

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 Work
Text
Monograph		 16276896
16. Marrian, Christie R. K. Technology of proximal probe lithography Bellingham, Wash: SPIE Optical Engineering Press; c1993

 BIBFRAME Instances
 Instance 1577791
17. Jain, Kanti, 1948- Excimer laser lithography Bellingham, Wash., USA: SPIE Optical Engineering Press; c1990

 BIBFRAME Instances
 Instance 3871905
18. Levinson, Harry J. Lithography process control Bellingham, Wash: SPIE Optical Engineering Press; c1999

 BIBFRAME Instances
 Instance 4508656
19. Blais, Phillip D. Submicron lithography Bellingham, Wash: International Society for Optical Engineering; 1982

 BIBFRAME Instances
 Instance 3752512
20. European Mask and Lithography Conference (22nd : 2006 : Dresden, Germany) EMLC 2006 Bellingham, Wash: SPIE; c2006

 BIBFRAME Instances
 Instance 14674171


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