The Library of Congress > Linked Data Service

Refine your results

    No values
  Label Dataset Type Subdivision Identifier
1. Selected papers on resolution enhancement techniques in optical lithography

BIBFRAME Works
Work
Text
Monograph
13450340
2. Optical Society of America Extreme ultraviolet lithography

BIBFRAME Instances
Instance 1599703
3. European Mask and Lithography Conference (30th : 2014 : Dresden, Germany) 30th European Mask and Lithography Conference

BIBFRAME Works
Work
Text
Monograph
19172010
4. De Bisschop, Peter Modern optical lithography for semiconductor patterning

BIBFRAME Instances
Instance 23908120
5. Lin, Burn Jeng, 1942- Optical lithography

BIBFRAME Instances
Instance 21776685
6. Mack, Chris A. Fundamental principles of optical lithography

BIBFRAME Instances
Instance 15059841
7. Erdmann, Andreas Optical and EUV lithography

BIBFRAME Instances
Instance 21728574
8. Lin, Burn Jeng, 1942- Optical lithography

BIBFRAME Instances
Instance 21791304
9. Lin, Burn Jeng, 1942- Optical lithography

BIBFRAME Instances
Instance 15995580
10. Wong, Alfred Kwok-Kit Resolution enhancement techniques in optical lithography

BIBFRAME Instances
Instance 12289793
11. Mack, Chris A. Field guide to optical lithography

BIBFRAME Instances
Instance 14180590
12. Erdmann, Andreas Optical and EUV lithography

BIBFRAME Instances
Instance 21726932
13. Schellenberg, F. M., 1959- Selected papers on resolution enhancement techniques in optical lithography

BIBFRAME Instances
Instance 13450340
14. European Mask and Lithography Conference (30th : 2014 : Dresden, Germany) 30th European Mask and Lithography Conference

BIBFRAME Instances
Instance 19172010
15. European Mask and Lithography Conference (Conference) (32nd : 2016 : Dresden, Germany) 32nd European Mask and Lithography Conference

BIBFRAME Instances
Instance 20980314
16. European Mask and Lithography Conference (22nd : 2006 : Dresden, Germany) EMLC 2006

BIBFRAME Instances
Instance 14674171
17. European Mask and Lithography Conference (23rd : 2007 : Grenoble, France) EMLC 2007

BIBFRAME Instances
Instance 15004141
18. European Mask and Lithography Conference (24th : 2008 : Dresden, Germany) EMLC 2008

BIBFRAME Instances
Instance 16276896
19. OSA proceedings on extreme ultraviolet lithography

BIBFRAME Works
Work
Text
Monograph
1127472
20. Hoover, Richard B. X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography

BIBFRAME Instances
Instance 583008


Do you need assistance with your search?