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  Label Dataset Type Subdivision Identifier
1. Soft-X-ray Projection Lithography Topical Meeting (1992 : Monterey, Calif.) Soft-x-ray projection lithography Washington, DC: The Society; c1992

 BIBFRAME Instances
 Instance 1563444
2. Wilson, Alan D. X-ray lithography and applications of soft x-rays to technology Bellingham, Wash., USA: SPIE; 1983

 BIBFRAME Instances
 Instance 4243371
3. Khounsary, Ali M. Advances in mirror technology for X-ray, EUV lithography, laser and other applications II Bellingham, Wash: SPIE; c2004

 BIBFRAME Instances
 Instance 14006018
4. Hoover, Richard B. X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography Bellingham, Wash., USA: SPIE; c1991

 BIBFRAME Instances
 Instance 583008
5. Khounsary, Ali M. Advances in mirror technology for X-ray, EUV lithography, laser and other applications Bellingham, Wash., USA: SPIE; c2004

 BIBFRAME Instances
 Instance 13661012
6. Hoover, Richard B. Multilayer and grazing incidence X-ray/EUV optics for astronomy and projection lithography Bellingham, Wash: SPIE; c1993

 BIBFRAME Instances
 Instance 4399355
7. Soft-X-ray Projection Lithography Topical Meeting (1992 : Monterey, Calif.) Soft-x-ray projection lithography

 BIBFRAME Works
 Work
Text
Monograph		 1563444
8. Photomask Japan 2003 (2003 : Yokohama, Japan) Photomask and next-generation lithography mask technology X

 BIBFRAME Works
 Work
Text
Monograph		 13577501
9. X-ray lithography and applications of soft x-rays to technology

 BIBFRAME Works
 Work
Text
Monograph		 4243371
10. Celler, George K. Materials aspects of x-ray lithography Pittsburgh, Pa: Materials Research Society; 1993

 BIBFRAME Instances
 Instance 4889250
11. Hawryluck, Andrew M. OSA proceedings on soft x-ray projection lithography Washington, D.C.: The Society; c1993

 BIBFRAME Instances
 Instance 1090703
12. Advances in mirror technology for X-ray, EUV lithography, laser and other applications II

 BIBFRAME Works
 Work
Text
Monograph		 14006018
13. Multilayer and grazing incidence X-ray/EUV optics for astronomy and projection lithography

 BIBFRAME Works
 Work
Text
Monograph		 4399355
14. Advances in mirror technology for X-ray, EUV lithography, laser and other applications

 BIBFRAME Works
 Work
Text
Monograph		 13661012
15. X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography

 BIBFRAME Works
 Work
Text
Monograph		 583008
16. OSA proceedings on soft x-ray projection lithography

 BIBFRAME Works
 Work
Text
Monograph		 1090703
17. Materials aspects of x-ray lithography

 BIBFRAME Works
 Work
Text
Monograph		 4889250
18. Photomask Japan 2002 (2002 : Yokohama, Japan) Photomask and next-generation lithography mask technology IX

 BIBFRAME Works
 Work
Text
Monograph		 13588437
19. Photomask and next-generation lithography mask technology XI

 BIBFRAME Works
 Work
Text
Monograph		 14005596
20. Photomask and next-generation lithography mask technology XII

 BIBFRAME Works
 Work
Text
Monograph		 14199305


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