URI(s)
Identifies LC/NAF RWO
Identifies RWO
Exact Matching Concepts from Other Schemes
Closely Matching Concepts from Other Schemes
Sources
- found: Extreme ultraviolet lithography, c2009:t.p. (Ajay Kumar; Ph. D., general manager, Cleans and Mask Products Business Group, Applied Materials, Inc.)
- found: Email correspondence with McGraw-Hill Professional, Jan. 26, 2009(Ajay Kumar; b. March 10, 1962)
- found: Applied Materials web site, viewed Jan. 26, 2009(Ajay Kumar; Ph. D., Indian Institute of Technology in applied physics; post doctoral work, U. Oklahoma and Stanford U.)
Instance Of
Scheme Membership(s)
Collection Membership(s)
Change Notes
- 2009-01-26: new
Alternate Formats