URI(s)
Variants
- Semiconductor Manufacturing Technology Consortium
Identifies LC/NAF RWO
Identifies RWO
Later Established Forms
Exact Matching Concepts from Other Schemes
Closely Matching Concepts from Other Schemes
Sources
- found: Dry processing for submicrometer lithography, c1990:t.p. (SEMATECH)
- found: Acron., init. & abb. dict., 1991(Semiconductor Manufacturing Technology Consortium, SEMATECH)
- found: Communication with International SEMATECH, Nov. 28, 2001(name changed in 2000 to International SEMATECH. At one time, we did have SEMATECH and its subsidiary International SEMATECH. Now, the primary name is International SEMATECH and two entities have been combined)
Instance Of
Scheme Membership(s)
Collection Membership(s)
Change Notes
- 1991-05-06: new
- 2001-11-29: revised
Alternate Formats