URI(s)
- http://id.loc.gov/authorities/subjects/sh2008009220
- http://id.loc.gov/authorities/sh2008009220#concept
Variants
- Lithography, Immersion
Broader Terms
Closely Matching Concepts from Other Schemes
Sources
- found: Work cat.: 2008050743: Wei, Yayi. Advanced processes for 193-nm immersion lithography, c2009.
- found: Inspec, viewed Nov. 24, 2008(controlled term: Immersion lithography)
- found: Wikipedia, viewed Nov. 24, 2008(Immersion lithography)
Instance Of
Scheme Membership(s)
Collection Membership(s)
Change Notes
- 2008-12-17: new
- 2008-12-18: revised
Alternate Formats
