Jones, Susan K.
URI(s)
Identifies LC/NAF RWO
Identifies RWO
Exact Matching Concepts from Other Schemes
Sources
- found: Metrology, inspection and process control for microlithography X, c1996:t.p. (Susan K. Jones) p. ix (FED Corp.)
- notfound: WW in sci. and engineer. 1996-1997;WW in America;WW of Amer. Women 1995-1996.
Instance Of
Scheme Membership(s)
Collection Membership(s)
Change Notes
- 1996-08-29: new
- 1996-09-04: revised
Alternate Formats